A collaboration between ASML B.V. and the Signal Processing Systems group, focusing on deep generative models for lithography and metrology. The project is headed by dr. Ruud van Sloun (TU/e) and dr. Alexandru Onose (ASML), and executed by Esther van Pelt. Dr. Harm Belt (TU/e + ASML) and dr. Wouter Kouw (TU/e) assist in supervision.